Electron-impact rotational excitation of : relevance for thermalization and dissociation dynamics

Author:

Faure Alexandre1,Wiesenfeld Laurent1,Valiron Pierre1,Tennyson Jonathan2

Affiliation:

1. Laboratoire d'Astrophysique, UMR 5571 CNRS, Université Joseph-FourierBP 53, 38041 Grenoble Cédex 09, France

2. Department of Physics and Astronomy, University College LondonGower Street, London WC1E 6BT, UK

Abstract

Electrons are known to be efficient in rotationally exciting molecular ions in low-density astrophysical plasmas. Rotational excitation of molecular ions has also been shown to affect the measured values of dissociative recombination (DR) rate coefficients. Thus, electron collisions with are expected to play a significant role in thermalization and dissociation dynamics of this ion, both in the laboratory and in space. Using the molecular R -matrix method combined with the adiabatic-nuclei-rotation approximation, we have computed new rate coefficients for the rotational excitation of by electrons at temperatures from 10 to 10 000 K. De-excitation rates are found to amount to a few 10 −7  cm 3  s −1 below 1000 K, i.e. comparable in magnitude to that of DR. In astrophysical environments where the electron fraction exceeds 10 −4 , electron collisions are thus expected to contribute to the non-thermal rotational distribution of . The competition between electron and neutral collisions is discussed in the context of recent observations of towards Galactic centre sources.

Publisher

The Royal Society

Subject

General Physics and Astronomy,General Engineering,General Mathematics

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3