Effect of Oxygen Plasma Treatment on p-Type Electrical Properties of Amorphous La2NiO4+δ Thin Films-Reference-Cited by-同舟云学术

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Effect of Oxygen Plasma Treatment on p-Type Electrical Properties of Amorphous La₂NiO_4+δ Thin Films

Published:2015-08-01 Issue:4 Volume:10 Page:475-479
ISSN:1555-130X
Container-title:Journal of Nanoelectronics and Optoelectronics
language:en
Short-container-title:Journal of Nanoelectronics and Optoelectronics

Author:

Hop Dang-Hoang,Heo Young-Woo,Kim Jeong-Joo,Park Soo-Young,Kang Inn-Kyu,Kim Youngkyoo,Lee Joon-Hyung

Publisher

American Scientific Publishers

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Oxygen nonstoichiometry and electrical properties of La2–xSrxNiO4+δ (0 ≤ x ≤ 0.5);Journal of the Korean Ceramic Society;2020-04-28

2. Ruddlesden–Popper perovskites in electrocatalysis;Materials Horizons;2020

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