Investigation of the Flatband Voltage (VFB) Shift of Al2O3 on N2 Plasma Treated Si Substrate
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Published:2013-09-01
Issue:9
Volume:13
Page:6275-6279
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ISSN:1533-4880
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Container-title:Journal of Nanoscience and Nanotechnology
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language:en
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Short-container-title:j. nanosci. nanotech.
Author:
Kim Hyungchul,Lee Jaesang,Jeon Heeyoung,Park Jingyu,Jeon Hyeongtag
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering