Full Field Analysis of Critical Dimension Uniformity Due to Focal Variation for Contact Features in Extreme Ultraviolet Lithography
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Published:2014-03-01
Issue:3
Volume:14
Page:2630-2634
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ISSN:1533-4880
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Container-title:Journal of Nanoscience and Nanotechnology
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language:en
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Short-container-title:j nanosci nanotechnol
Author:
Kuo Hung-Fei,Frederick .
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering