Etch Characteristics of Magnetic Tunnel Junction Materials Using Bias Pulsing in the CH4/N2O Inductively Coupled Plasma
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Published:2014-12-01
Issue:12
Volume:14
Page:9541-9547
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ISSN:1533-4880
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Container-title:Journal of Nanoscience and Nanotechnology
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language:en
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Short-container-title:j nanosci nanotechnol
Author:
Jeon Min Hwan,Youn Ji Youn,Yang Kyung Chae,Yun Deok Hyun,Lee Du Yeong,Shim Tae Hun,Park Jea Gun,Yeom Geun Young
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering