Built-In Self Test (BIST) Architecture Simulation for Testing Crosstalk Effects in Array Structured Through Silicon Vias (TSV) in 3DICs

Author:

Praveen Kumar Reddy K.1,Bennila Thangammal C.2,Rangarajan P.3

Affiliation:

1. Department of EEE, RMD Engineering College, Chennai 601206, Tamilnadu, India

2. Department of ECE, RMD Engineering College, Chennai 601206, Tamilnadu, India

3. Electronics Subject Matter Expert, L&T Head Quarters, Chennai 600089, Tamilnadu, India

Abstract

In this research, a BIST (built in self test) architecture for testing crosstalk effects in highly dense Through Silicon Via (TSV) placed in structured array form, in 3DICs (Three Dimensional integrated circuits), designed and simulated using the Xilinx ISE tool and the VHDL language. A novel methodology is proposed, and simulated, to observe the test responses of the victim TSVs in the chosen group simultaneously. Boundary-scan cell structures are modified, created for the purpose of operating in different modes such as shift, update and capture in either conventional serial shift mode as well as in proposed parallel broadcasting mode. Output Response Analyzers (ORA), or signature analyzers that have been simulation-verified. In this study, we suggested a novel encoder-based signature generator to locate faulty TSVs in the parallel-observed TSVs. This paper discusses the whole BIST architecture, the BIST controller built on an algorithmic state machine, the design of TPG (Test Pattern Generator), and the faulty TSV signature generator. Comparing the BIST architecture, to serial shift based interconnect tests done by IEEE 1149.1 (JTAG) such as EXTEST and IEEE 1838 standards, the test’s time complexity of BIST is relatively very low. The entire TSV array test is completed in just 32 clock cycles. The design is adaptable and can be used to broadcast test patterns to a group or to transmit test patterns serially using IEEE 1838 or 1149.1.

Publisher

American Scientific Publishers

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

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