Spatially-Regulated Deposition of Quantum Dots on the Patterned Polymer Brush
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Published:2020-08-01
Issue:8
Volume:20
Page:5201-5210
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ISSN:1533-4880
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Container-title:Journal of Nanoscience and Nanotechnology
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language:en
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Short-container-title:j nanosci nanotechnol
Author:
Sato Tomoya1,
Dunderdale Gary J.1,
Urata Chihiro1,
Hozumi Atsushi1
Affiliation:
1. National Institute of Advanced Industrial Science and Technology (AIST), 2266-98, Anagahora, Shimoshidami, Moriyama, Nagoya, 463-8560, Japan
Abstract
We have demonstrated direct patterning of surface initiator layer (SIL) for Atom Transfer Radical Polymerization (ATRP) using a sol–gel based “ink” containing (p-chloromethyl)phenyltrimethoxysilane and tetraethoxysilane for an inkjet printer. Mechanically/chemically
robust and smooth micropatterns of SIL several tens of micrometer in width and 15 nm thickness were directly printed on silicon substrates under mild conditions (open to the atmosphere, at ~28 °C under >60% relative humidity). Subsequent surface-initiated ATRP of glycidyl methacrylate
(GMA) under the air atmosphere gave area-selective/stepwise growth of homogeneous polyGMA brushes (pGMA) from the micropatterns of SIL. This area-selective growth of pGMA was also confirmed by a fluorescence microscopy. Because of chemical reactivity of epoxy groups on the grafted pGMA
surfaces toward amino-functionalized nanomaterials, CdS/ZnS-alloyed quantum dots were spatially deposited only on the pGMA-covered regions with a complete area-selectivity.
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering