Author:
Ferlauto Andre S.,Oliveira Sergio,Silva Edelma E.,Magalhaes-Paniago Rogerio,Ladeira Luiz O.,Lacerda Rodrigo G.
Abstract
Amorphous silica nanowires have been produced by thermal annealing of Si/SiO2/Ni substrate structures at 900 °C under an atmosphere of hexamethyldisilazane (HMDS) and hydrogen (H2). The wires have diameter ranging from 35 to 55 nm, which are controlled by the
Ni particle size. It is demonstrated that the growth occurs through vapor–liquid–solid mechanisms, and it is proposed that the vapor source is volatile SiO generated from the etching of the Si substrate through active oxidation reactions. The role of the HMDS-H2 atmosphere
in promoting such reactions is discussed.
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering
Cited by
6 articles.
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