Highly Selective Etching of SnO2 Absorber in Binary Mask Structure for Extreme Ultra-Violet Lithography
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Published:2012-04-01
Issue:4
Volume:12
Page:3334-3340
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ISSN:1533-4880
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Container-title:Journal of Nanoscience and Nanotechnology
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language:en
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Short-container-title:j. nanosci. nanotech.
Author:
Lee Soo Jin,Jung Chang Yong,Park Sung Jin,Hwangbo Chang Kweun,Seo Hwan Seok,Kim Sung Soo,Lee Nae-Eung
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering