Al2O3/TiO2 Multilayer Passivation Layers Grown at Low Temperature for Flexible Organic Devices-Reference-Cited by-同舟云学术

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Al₂O₃/TiO₂ Multilayer Passivation Layers Grown at Low Temperature for Flexible Organic Devices

Published:2012-04-01 Issue:4 Volume:12 Page:3696-3700
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:j. nanosci. nanotech.

Author:

Kwon Tae-Suk,Moon Dae-Yong,Moon Yeon-Keon,Kim Woong-Sun,Park Jong-Wan

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Two-step construction of KPDMS/Al₂O₃ ultra-barriers for wearable sensors;Dalton Transactions;2024

2. Membrane Fabrication and Modification by Atomic Layer Deposition: Processes and Applications in Water Treatment and Gas Separation;ACS Applied Materials & Interfaces;2023-03-10

3. Conformal and Transparent Al2O3 Passivation Coating via Atomic Layer Deposition for High Aspect Ratio Ag Network Electrodes;Metals;2023-03-06

4. Conformal and Transparent Al2o3 Passivation Coating Via Atomic Layer Deposition for High Aspect Ratio Ag Network Electrodes;SSRN Electronic Journal;2022

5. 32.5: An Advanced Micro‐LED Backplane Structure with Reflective Layer and Color Filter;SID Symposium Digest of Technical Papers;2021-08

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