Spectroscopic Ellipsometry Analysis of Amorphous Silicon Thin Films for Si-Nanocrystals-Reference-Cited by-同舟云学术

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Spectroscopic Ellipsometry Analysis of Amorphous Silicon Thin Films for Si-Nanocrystals

Published:2012-04-01 Issue:4 Volume:12 Page:3228-3232
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:j. nanosci. nanotech.

Author:

Park Jinjoo,Iftiquar S. M.,Kim Youngkuk,Park Seungman,Lee Sunwha,Kim Joondong,Yi Junsin

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Growth of crystalline silicon by a seed layer approach using plasma enhanced chemical vapor deposition;Physica B: Condensed Matter;2021-05

2. Investigation of p-type nanocrystalline silicon oxide thin film prepared at various growth temperatures;Materials Chemistry and Physics;2019-05

3. Improvement of Electrical Performance in P-Channel LTPS Thin-Film Transistor with a-Si:H Surface Passivation;Materials;2019-01-07

4. The Variation of Crystalline Structure Induced by Gas Dilution and Thermal Annealing in Silicon Layers Deposited by PECVD Technique;Silicon;2018-12-07

5. Improving the efficiency of rear emitter silicon solar cell using an optimized n-type silicon oxide front surface field layer;Scientific Reports;2018-07-13

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