Surface Planarization of Low-Temperature Flowable Silicon Oxide for Atomic Layer Deposition Al2O3 Thin Film Encapsulation
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Published:2019-05-01
Issue:5
Volume:19
Page:2882-2887
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ISSN:1533-4880
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Container-title:Journal of Nanoscience and Nanotechnology
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language:en
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Short-container-title:j nanosci nanotechnol
Author:
Yong Sang Heon1,
Kim Sun Jung1,
Chae Heeyeop1
Affiliation:
1. School of Chemical Engineering, Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering