Quantitative Analysis of X-ray Fluorescence Absorption and Emission for Thickness Determination of ALD-Grown Metal and Oxide Nanoscaled Films-Reference-Cited by-同舟云学术

Quantitative Analysis of X-ray Fluorescence Absorption and Emission for Thickness Determination of ALD-Grown Metal and Oxide Nanoscaled Films

Published:2017-08-01 Issue:8 Volume:17 Page:5745-5750
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:j nanosci nanotechnol

Author:

Abdel-Fattah Tarek M¹,Wixtrom Alex¹,Arias Larry²,Zhang Kai³,Baumgart Helmut³

Affiliation:

1. Applied Research Center Thomas Jefferson National Accelerator Facility and Department of Molecular Biology and Chemistry at Christopher Newport University, Newport News, Virginia 23606, United States

2. Bruker AXS, Inc., Madison, WI, 53711, United States

3. ODU-Applied Research Center, Newport News, VA, and Department of Electrical Engineering, Old Dominion University, Norfolk, Virginia 23529, United States

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

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