50-nm Nano-Scaled Vertical-Transistor with NiSi2 Seed-Induced Vertically Crystallized Poly-Silicon Channel for Very-Large-Scale-Integration
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Published:2017-02-01
Issue:2
Volume:17
Page:1296-1299
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ISSN:1533-4880
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Container-title:Journal of Nanoscience and Nanotechnology
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language:en
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Short-container-title:j nanosci nanotechnol
Author:
Park Jae Hyo1,
Kim Hyung Yoon1,
Seok Ki Hwan1,
Kiaee Zohreh1,
Chae Hee Jae1,
Joo Seung Ki1
Affiliation:
1. Research Institute of Advanced Materials (RIAM), Department of Material Science and Engineering, Seoul National University, Seoul 151-742, Republic of Korea
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering