Effect of Deposition Temperature on the Characteristics of HfNx Thin Films Prepared by Plasma Assisted Cyclic Chemical Vapor Deposition
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Published:2010-05-01
Issue:5
Volume:10
Page:3463-3466
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ISSN:1533-4880
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Container-title:Journal of Nanoscience and Nanotechnology
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language:en
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Short-container-title:J. Nanosci. Nanotech.
Author:
Kim Eun-Jeong,Woo Hee-Gweon,Kim Do-Heyoung
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering
Cited by
1 articles.
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