Preparation of Phosphorus Doped Hydrogenated Microcrystalline Silicon Thin Films by Inductively Coupled Plasma Chemical Vapor Deposition and Their Characteristics for Solar Cell Applications-Reference-Cited by-同舟云学术

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Preparation of Phosphorus Doped Hydrogenated Microcrystalline Silicon Thin Films by Inductively Coupled Plasma Chemical Vapor Deposition and Their Characteristics for Solar Cell Applications

Published:2008-10-01 Issue:10 Volume:8 Page:5521-5526
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:j nanosci nanotechnol

Author:

Jeong Chaehwan,Boo Seongjae,Kim Tae-Won,Choi Bum-Ho,Kim Ho-Sung,Chang Duck-Rye,Lee Jong-Ho,Kamisako Koichi

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigations on phosphorus doped amorphous/nanocrystalline silicon films deposited by a filtered cathodic vacuum arc technique in the presence of hydrogen gas;Materials Science in Semiconductor Processing;2015-03

2. Study of Phosphorus Doped Micro/Nano Crystalline Silicon Films Deposited by Filtered Cathodic Vacuum Arc Technique;Silicon;2014-10-12

3. Catalytic Decomposition of PH3on Heated Tungsten Wire Surfaces;Japanese Journal of Applied Physics;2012-08-01

4. Catalytic Decomposition of PH$_{3}$ on Heated Tungsten Wire Surfaces;Japanese Journal of Applied Physics;2012-07-13

5. In-situ production of PH3 from red phosphorus and atomic hydrogen;Chemical Physics Letters;2011-09

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