Author:
Park Y. K.,Umar Ahmad,Kim S. H.,Kim J.-H.,Lee E. W.,Vaseem M.,Hahn Y. B.
Abstract
Large-quality, well-crystallized growth of ZnO nanowires was done via non-catalytic thermal evaporation process on silicon substrate only by using metallic zinc powder and oxygen as source materials for zinc and oxygen, respectively. The electrical properties of the as-grown ZnO nanowires
were examined by fabricating a single nanowire based FETs which were fabricated via two approaches, i.e., back- and top-gate approaches by using electron beam lithography (EBL) and photolithography processes. ZnO FETs electrical properties were characterized by IDS–VDS
and IDS–VGS measurement. The fabricated single ZnO nanowire based FETs by back- and top-gate approaches exhibited field effect mobilities of ∼4.25 and ∼12.76 cm2/Vs, respectively. Moreover, the carrier concentrations for the fabricated
back- and top-gate FETs were ∼1.6 × 1017 and ∼1.37 × 1018 cm−3, respectively. From our studies it was observed that the fabricated top-gate FETs exhibited higher and good electrical properties as compared to ZnO nanowire FETs fabricated
using back-gate approaches.
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering
Cited by
17 articles.
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