Study of Nitrogen Diffusion Profile of Low Resistivity Diffusion Barrier by Resputtering Technology
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Published:2009-02-01
Issue:2
Volume:9
Page:759-763
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ISSN:1533-4880
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Container-title:Journal of Nanoscience and Nanotechnology
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language:en
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Short-container-title:J. Nanosci. Nanotech.
Author:
Tsao Jung-Chih,Liu Chuan-Pu,Wang Ying-Lang,Chen Kei-Wei
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering