Properties of NiAl and Ni-Al-N Thin Films Deposited by Closed Field Unbalanced Magnetron Sputter Ion Plating Using Elemental Ni and Al Targets
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Published:2009-07-01
Issue:7
Volume:9
Page:4034-4039
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ISSN:1533-4880
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Container-title:Journal of Nanoscience and Nanotechnology
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language:en
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Short-container-title:J. Nanosci. Nanotech.
Author:
Baig M. N.,Ahmed W.,Khalid F. A.,Said R. M.,McLaughlin J.
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering