Quantum Efficiency Simulation and Analysis of Irradiated Complementary Metal-Oxide Semiconductor Image Sensors

Author:

Fu Jing1,Wen Lin1,Feng Jie1,Wei Ying1,Zhou Dong1,Li Yu-Dong1,Guo Qi1

Affiliation:

1. Key Laboratory of Functional Materials and Devices for Special Environments of Chinese Academy of Sciences, Xin Jiang Technical Institute of Physics and Chemistry, Urumqi, 830011, China

Abstract

A quantum efficiency model of complementary metal-oxide semiconductor image sensors based on Shockley–Read–Hall and Auger recombination is developed using the technology computer-aided design tool, and the quantum efficiency degradation after irradiation is analyzed. By simulating the surface recombination velocity and depletion region width of the photodiode, the decrease in the quantum efficiency of complementary metal-oxide semiconductor image sensors under short and long incident light wavelengths is found to be caused by the increase in the surface recombination velocity and capture of optical carriers by radiation-induced defects in the epitaxial layer, respectively. In addition, a method to reduce the quantum efficiency degradation behavior of an irradiated pixel is discussed.

Publisher

American Scientific Publishers

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Reference23 articles.

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