Properties of MoO3 films by thermal oxidation: Annealing induced phase transition-Reference-Cited by-同舟云学术

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Properties of MoO3 films by thermal oxidation: Annealing induced phase transition

Published:2013-06-01 Issue:2 Volume:3 Page:135-143
ISSN:2158-5849
Container-title:Materials Express
language:en
Short-container-title:mat express

Author:

Madhavi Vempulri,Kondaiah Paruchuri,Rayudu Suguru Subba,Hussain Obili Mahammad,Uthanna Suda

Publisher

American Scientific Publishers

Subject

General Materials Science

Cited by 39 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The n-MoO3/p-Si heterojunction photodiode: Influence of the MoO3 film thickness on the ultraviolet and infrared photodetector performance;Optical Materials;2024-11

2. Nanostructural modulation of Schottky barrier in Au/α-MoO3 heterojunction via Au nanoparticle size control;Applied Surface Science;2024-10

3. A Fully‐Bioresorbable Nanostructured Molybdenum Oxide‐Based Electrode for Continuous Multi‐Analyte Electrochemical Sensing;Advanced Materials Interfaces;2024-06-19

4. Shock-Induced Melting and Recrystallization of MoO3 Studied by Dynamic X-Ray Diffraction;Journal of Dynamic Behavior of Materials;2024-06-14

5. Optimization of deposition conditions to tune optoelectronic properties of MoO3-x films prepared by RF-sputtering technique;Vacuum;2023-10

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