Atomic Vapor Deposition Approach to In<SUB>2</SUB>O<SUB>3</SUB> Thin Films-Reference-Cited by-同舟云学术

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Atomic Vapor Deposition Approach to In₂O₃ Thin Films

Published:2011-09-01 Issue:9 Volume:11 Page:8094-8100
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:J. Nanosci. Nanotech.

Author:

Hellwig Malte,Parala Harish,Cybinksa Joanna,Barreca Davide,Gasparotto Alberto,Niermann Benedikt,Becker Hans-Werner,Rogalla Detlef,Feydt Jürgen,Irsen Stephan,Mudring Anja-Verena,Winter Jörg,Fischer Roland A.,Devi Anjana

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High-quality transparent conductive indium oxide film deposition by reactive pulsed magnetron sputtering: Determining the limits of substrate heating;Applied Surface Science;2022-05

2. Synthesis of New Heteroleptic Indium Complexes as Potential Precursors for Indium Oxide Thin Films;European Journal of Inorganic Chemistry;2021-06-15

3. Hafnium Oxide and Hydrogen Co-Doped Indium Oxide Films Deposited by Magnetron Sputtering Technology;Advanced Materials Research;2021-01

4. Effect of Deposition Rate and Annealing on Physical Properties of In2O3 Thin Films Prepared by Spray Pyrolysis: Ultraviolet (UV) Photoconductivity Response;Journal of Electronic Materials;2017-03-29

5. New amidinate complexes of indium(iii): promising CVD precursors for transparent and conductive In2O3 thin films;Dalton Transactions;2017

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