Room-Temperature Formation of Low Refractive Index Silicon Oxide Films Using Atmospheric-Pressure Plasma-Reference-Cited by-同舟云学术

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Room-Temperature Formation of Low Refractive Index Silicon Oxide Films Using Atmospheric-Pressure Plasma

Published:2011-04-01 Issue:4 Volume:11 Page:2851-2855
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:J. Nanosci. Nanotech.

Author:

Nakamura Kei,Yamaguchi Yoshihito,Yokoyama Keiji,Higashida Kosuke,Ohmi Hiromasa,Kakiuchi Hiroaki,Yasutake Kiyoshi

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Silicon Dioxide Coating of Titanium Dioxide Nanoparticles from Dielectric Barrier Discharge in a Gaseous Mixture of Silane and Nitrogen;Plasma Chemistry and Plasma Processing;2013-08-01

2. Antireflective Hydrophobic Si Subwavelength Structures Using Thermally Dewetted Ni/SiO2 Nanomask Patterns;Journal of Nanoscience and Nanotechnology;2011-11-01

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