Characteristics of Palladium Doped Amorphous Carbon Films Fabricated by Unbalanced Magnetron Sputtering System-Reference-Cited by-同舟云学术

Characteristics of Palladium Doped Amorphous Carbon Films Fabricated by Unbalanced Magnetron Sputtering System

Published:2021-06-01 Issue:6 Volume:16 Page:905-910
ISSN:1555-130X
Container-title:Journal of Nanoelectronics and Optoelectronics
language:en
Short-container-title:Journal of Nanoelectronics and Optoelectronics

Author:

Park Yong Seob¹,Kim Young-Baek²,Hwang Sung Hwan³,Lee Jaehyeong⁴

Affiliation:

1. Department of Electronics, Chosun College of Science and Technology, Gwangju, 61453, Korea

2. Center for Nano-Photonics Convergence Technology, Korea Institute of Industrial Technology, Gwangju, 61012, Korea

3. Korea Photonics Technology Institute (KOPTI), Gwangju, 61007, Korea

4. Department of Electronic and Electrical Engineering, Sungkyunkwan University, Suwon, 16419, Korea

Abstract

Generally, hydrogenated amorphous carbon (a-C:H) has been shown to have a low friction coefficient, high hardness, and low abrasive wear rate. In this study, Pd doped hydrogenated amorphous carbon (a-C:H:Pd) fabricated by the closed-field unbalanced magnetron sputtering (CFUBMS) system with two targets of carbon and palladium in Ar/C2H2 plasma. The tribological and lubricant characteristics for a-C:H:Pd fabricated with various DC bias voltage from 0 to −200 V were investigated. We obtained a hardness up to 27.5 GPa and friction coefficient lower than 0.1. The atomic percentage of Pd related to the lubricant properties increased up to 22% at −200 V. In the results, the Pd doping in the a-C:H films improved the tribological and lubricant properties. The friction coefficient value of a-C:H:Pd films was decreased, the hardness and elastic modulus were increased, and also the adhesion properties was improved with the increase of negative DC bias voltage.

Publisher

American Scientific Publishers

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials