Electrical, Structural, and Morphological Characteristics of Dopantless Tin Oxide Films Prepared by Low Pressure Chemical Vapor Deposition-Reference-Cited by-同舟云学术

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Electrical, Structural, and Morphological Characteristics of Dopantless Tin Oxide Films Prepared by Low Pressure Chemical Vapor Deposition

Published:2016-01-01 Issue:1 Volume:8 Page:117-121
ISSN:1947-2935
Container-title:Science of Advanced Materials
language:en
Short-container-title:sci adv mater

Author:

Kim Jun-Hyun,Cho Sung-Woon,Kang Doo Won,Lee Kyung Mi,Baek Chang Yong,Lee Hae-Min,Kim Chang-Koo

Publisher

American Scientific Publishers

Subject

General Materials Science

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electrical Resistivity of Ni–Fe Wires Coated with Sn Using low-Pressure Chemical Vapor Deposition;Coatings;2020-03-27

2. Palladium nanoparticles decorated SnO2 wrapped MWCNT nanocomposites as a highly efficient H2O2 electrocatalyst;New Journal of Chemistry;2019

3. Pt nanoparticles decorated SnO2 nanoneedles for efficient CO gas sensing applications;Sensors and Actuators B: Chemical;2018-03

4. Highly sensitive carbon monoxide (CO) gas sensors based on Ni and Zn doped SnO2 nanomaterials;Ceramics International;2018-03

5. Control of the electrical resistivity of Ni-Cr wires using low pressure chemical vapor deposition of tin;Applied Surface Science;2018-01

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