Etching Mechanism on HfAlO3 Thin Films Using Adaptively Coupled Plasma System
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Published:2016-12-01
Issue:12
Volume:8
Page:2309-2312
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ISSN:1947-2935
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Container-title:Science of Advanced Materials
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language:en
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Short-container-title:sci adv mater
Author:
Huang Jing,Joo Young-Hee,Kim Chang-Il
Publisher
American Scientific Publishers
Subject
General Materials Science