Plasma Damage Effects on SiO2 Thin Films Determined by Nanoindenter Under Various Etching Conditions Using ACP Source
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Published:2016-09-01
Issue:9
Volume:8
Page:1778-1782
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ISSN:1947-2935
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Container-title:Science of Advanced Materials
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language:en
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Short-container-title:sci adv mater
Author:
In Kim Soo,Lee Jae Hoon,Kim Hong-Ki,Kim Sang Jin,Il Seo Sang,Kim Nam-Hun,Lee Chang Woo
Publisher
American Scientific Publishers
Subject
General Materials Science