Influence of the Excess Al Content on Memory Behaviors of WORM Devices Based on Sputtered Al-Rich Aluminum Oxide Thin Films
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Published:2014-09-01
Issue:9
Volume:6
Page:845-848
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ISSN:1941-4900
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Container-title:Nanoscience and Nanotechnology Letters
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language:en
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Short-container-title:Nanosci Nanotechnol Lett
Author:
Liu Z.,Liu P.,Li H. K.,Chen T. P.
Publisher
American Scientific Publishers
Subject
General Materials Science