An Analytic Gradient-Based Inverse Lithography Approach for Partially-Coherent Double-Exposure Lithography
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Published:2010-01-01
Issue:1
Volume:7
Page:157-164
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ISSN:1546-1955
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Container-title:Journal of Computational and Theoretical Nanoscience
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language:en
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Short-container-title:Jnl of Comp & Theo Nano
Author:
Xiong Wei,Zhang Jinyu,Tsai Min-Chun,Wang Yan,Yu Zhiping
Publisher
American Scientific Publishers
Subject
Electrical and Electronic Engineering,Computational Mathematics,Condensed Matter Physics,General Materials Science,General Chemistry