Analysis and Measurement of Volume Change by Transformation of Crystal Between Hf and HfOx Thin Film During Oxidation Using Nanoindenter

Abstract

In this study, nanomechanical properties were analyzed using a nanotribology method. The nanoindenter system is the main analysis method in nanotribology. The nanoindenter can measure the induced stresses, elastic modulus, and stabilities of Hf and HfO2 thin film surfaces as a function of the annealing temperature. The surface hardness and elastic modulus decreased, except at 600 °C, from 8.1 to 6.22 GPa and from 143.87 to 93.68 GPa, respectively, as the annealing temperature was increased from the as-deposited state to 800 °C. These results were related to the surface oxidation of the Hf thin film or the formation of a HfO2 monoclinic crystal. The change in the crystal structure caused an increase in volume that subsequently induced a compressive stress.