High Density of Line Pattern by Using De-Wetting During Soft-Lithography
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Published:2015-02-01
Issue:2
Volume:15
Page:1452-1455
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ISSN:1533-4880
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Container-title:Journal of Nanoscience and Nanotechnology
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language:en
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Short-container-title:j nanosci nanotechnol
Author:
Lee Jisun,Lee Su Kyoung,Jung Jin-Mi,Jung Hee-Tae
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering