Atomic Layer Deposition of Zirconium-Based High-k Metal Gate Oxide: Effect of Si Containing Zr Precursor
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Published:2015-01-01
Issue:1
Volume:15
Page:382-385
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ISSN:1533-4880
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Container-title:Journal of Nanoscience and Nanotechnology
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language:en
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Short-container-title:j nanosci nanotechnol
Author:
Cho Jun Hee,Lee Sang-Ick,Kim Jong Hyun,Yim Sang Jun,Shin Hyung Soo,Han Mi Jeong,Chae Won Mook,Lee Sung Duck,Ahn Chi Young,Kim Myong-Woon
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering