Direct Tailoring the Si Substrate for Antireflection via Random Nanohole Nanoimprint-Reference-Cited by-同舟云学术

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Direct Tailoring the Si Substrate for Antireflection via Random Nanohole Nanoimprint

Published:2015-02-01 Issue:2 Volume:15 Page:1297-1303
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:j nanosci nanotechnol

Author:

Sun Tangyou,Xu Zhimou,Xu Haifeng,Zhao Wenning,Wu Xinghui,Liu Sisi,Ma Zhichao,Zhang Zheng,He Jian,Liu Shiyuan,Peng Jing

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enhanced Performance of Nanotextured Silicon Solar Cells with Excellent Light-Trapping Properties;Photonics;2021-07-09

2. Wafer-scale high anti-reflective nano/micro hybrid interface structures via aluminum grain dependent self-organization;Materials & Design;2020-09

3. Sidewall Profile Dependent Nanostructured Ultrathin Solar Cells With Enhanced Light Trapping Capabilities;IEEE Photonics Journal;2020-02

4. Morphology-dependent high antireflective surfaces via anodic aluminum oxide nanostructures;Applied Surface Science;2019-12

5. Fabrication of nanopore and nanoparticle arrays with high aspect ratio AAO masks;Nanotechnology;2017-01-30

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