Post-Cleaning Effect on a HfO2 Gate Stack Using a NF3/NH3 Plasma
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Published:2016-05-01
Issue:5
Volume:16
Page:4808-4813
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ISSN:1533-4880
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Container-title:Journal of Nanoscience and Nanotechnology
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language:en
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Short-container-title:j nanosci nanotechnol
Author:
Lee Min-Seon,Oh Hoon-Jung,Lee Joo-Hee,Lee In-Geun,Shin Woo-Gon,Kim Kyu-Dong,Park Jin-Gu,Ko Dae-Hong
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering