Effect of CF4 Addition to Cl2/Ar Plasma on the Etching of ZrO2 Thin Films
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Published:2016-12-01
Issue:12
Volume:16
Page:12886-12889
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ISSN:1533-4880
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Container-title:Journal of Nanoscience and Nanotechnology
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language:en
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Short-container-title:j nanosci nanotechnol
Author:
Son Seok1,
Joo Young-Hee1,
Kim Chang-Il1
Affiliation:
1. School of Electrical and Electronics Engineering, Chung-Ang University, 06974, Korea
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering