Influence of Oxygen Gas Ratio on the Properties of Aluminum-Doped Zinc Oxide Films Prepared by Radio Frequency Magnetron Sputtering-Reference-Cited by-同舟云学术

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Influence of Oxygen Gas Ratio on the Properties of Aluminum-Doped Zinc Oxide Films Prepared by Radio Frequency Magnetron Sputtering

Published:2016-05-01 Issue:5 Volume:16 Page:5138-5142
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:j nanosci nanotechnol

Author:

Kim Minha,Jang Yong-Jun,Jung Ho-Sung,Song Woochang,Kang Hyunil,Kim Eung Kwon,Kim Donguk,Yi Junsin,Lee Jaehyeong

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of sputtering power and oxygen partial pressure on structural and opto-electronic properties of Al-doped ZnO transparent conducting oxides;Applied Surface Science;2024-10

2. Multifactorial investigations of the deposition process – Material property relationships of ZnO:Al thin films deposited by magnetron sputtering in pulsed DC, DC and RF modes using different targets for low resistance highly transparent films on unheated substrates;Vacuum;2022-09

3. Transparent and conductive cellulose film by controllably growing aluminum doped zinc oxide on regenerated cellulose film;Cellulose;2020-04-13

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