Replication and Surface Treatment of Micro Pattern Generated by Entanglement of Nanowires

Abstract

In this study, a nano-micro pattern was fabricated by a nanoimprint lithography process using a porous material, particularly anodic aluminum oxide (AAO), and polymer resin. The fabricated mold consisted of a group of nanowires forming a bundle and showing a specific micro pattern. The structures were subjected to various surface treatments to control surface conditions and wettability. UV-Ozone treatment and octadecyltrichlorosilane (OTS) coating were used as surface treatments. Through these surface treatments, the surface energy of the fabricated structure was lowered, and as a result, it could be used as a mold for nano-micro patterning. The final product was also fabricated through a nanoimprint lithography process, and the reverse image of the mold was duplicated. The surface of each structure was observed by scanning electron microscopy (SEM) and the surface properties were examined by contact angle measurement.