Two-Photon Stereolithography—Optical Nanolithography

Author:

Zhiganshina E. R.1,Arsenyev M. V.1,Chesnokov S. A.1

Affiliation:

1. Razuvaev Institute of Organometallic Chemistry, Russian Academy of Sciences

Abstract

Free-radical photopolymerization has been widely used in additive technologies, in particular, stereolithography using single- and two-photon initiated polymerization. The single-photon stereolithography affords the objects with about 100 μm resolution. The two-photon stereolithography initiated with a femtosecond near-infrared laser can afford arbitrary 3D microstructures with ultrahigh resolution at micro- and nanoscale level (~100 nm). Herein each of the mentioned method and the mechanisms of single- and two-photon excitation are reviewed. The recent results on the components of the photopolymerizable resin as well as the approaches to decrease the size of the elements of objects and accelerate their formation have been generalizated and systematized.

Publisher

The Russian Academy of Sciences

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