Affiliation:
1. IBM - T. J. Watson Research Center Yorktown Heights, New York
2. IBM Microelectronics Division Essex Junction, Vermont
3. The Texwipe Company Upper Saddle River, New Jersey
Abstract
A thin films fabrication facility using minienvironments and product-handling automation was benchmarked to determine the extent to which isolating products from the cleanroom avoids contamination. Data were collected from tests that simulated production conditions while controlling random variables. The study found that isolation factors of at least 1000 were demonstrated by settling wafer data, and 10,000 by aerosol data. In general, lowered room airflow did not significantly degrade minienvironment cleanliness. In addition, the study investigated reliability, electrostatic charge and electromagnetic interference issues, and materials outgassing.
Publisher
Institute of Environmental Sciences and Technology (IEST)
Subject
General Engineering,General Environmental Science
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献