Effect of Crystal Plane Orientation on Protrusion Formation during Sputter-Etching of SUS410 Stainless Steel
Author:
Affiliation:
1. Hiroshima Kokusai Gakuin University
2. Hiroshima Institute of Technology
3. Asahi Surface Tec LLC
4. Baoshan Iron & Steel Co. Ltd.
Publisher
Iron and Steel Institute of Japan
Subject
Materials Chemistry,Metals and Alloys,Physical and Theoretical Chemistry,Condensed Matter Physics
Link
https://www.jstage.jst.go.jp/article/tetsutohagane/103/2/103_TETSU-2016-059/_pdf
Reference19 articles.
1. 1) M.J. Witcomb: J. Mater. Sci., 9(1974), 551.
2. 2) G. Carter, B. Navinšek and J.L. Whitton: Sputtering by Particle Bombardment II, Topics in Applied Physics, Vol.52, ed. by R.Behrisch, Springer-Verlag, Berlin, (1983), 231.
3. 3) R.S. Robinson and S.M. Rossnagel: Ion Bombardment Modification of Surfaces, Fundamentals and Applications, Chap.7, eds. by O.Auciello and R.Kelly, Elsevier, Amsterdam, (1984), 299.
4. 4) G. Carter, M.J. Nobes and J.L. Whitton: Appl. Phy., A38(1985), 77.
5. 5) K. Nakasa, R. Wang, A. Yamamoto and T. Sumomogi: Tetsu-to-Hagané, 98(2012), 658.
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Formation of Fine Holes by Sputter Etching of Ti-15V-3Cr-3Al-3Sn Alloy and Commercially Pure Titanium;Journal of the Japan Institute of Metals and Materials;2020-05-01
2. Formation of Fine Protrusions by Sputter Etching of Commercially Pure Titanium;Journal of the Japan Institute of Metals;2017
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