Deposition of SiOx thin films on Y-TZP by reactive magnetron sputtering: influence of plasma parameters on the adhesion properties between Y-TZP and resin cement for application in dental prosthesis-Reference-Cited by-同舟云学术

Deposition of SiOx thin films on Y-TZP by reactive magnetron sputtering: influence of plasma parameters on the adhesion properties between Y-TZP and resin cement for application in dental prosthesis

Published:2011-05-27 Issue:2 Volume:14 Page:212-216
ISSN:1980-5373
Container-title:Materials Research
language:
Short-container-title:Mat. Res.

Author:

Queiroz José Renato Calvacanti de¹,Duarte Diego Alexandre²,Souza Rodrigo Othávio de Assunção e³,Fissmer Sara Fernanda²,Massi Marcos²,Bottino Marco Antonio¹

Affiliation:

1. São Paulo State University, Brazil

2. Technological Institute of Aeronautics, Brazil

3. Federal University of Paraíba, Brazil

Publisher

FapUNIFESP (SciELO)

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

http://www.scielo.br/pdf/mr/v14n2/aop_0681-10.pdf

Reference18 articles.

1. Materials for chairside CAD/CAM-produced restorations;Giordano R.;The Journal of the American Dental Association,2006

2. Current ceramic materials and systems with clinical recommendations: A systematic review;Conrad HJ;The Journal of Prosthetic Dentistry,2007

3. Clinical performance of CEREC ceramic inlays: a systematic review;Martin N;Dental Materials,1999

4. Adhesive cementation of high-strength ceramics;Blatz MB;Journal of Esthetic and Restorative Dentistry,2007

5. Effect of an internal coating technique on tensile bond strengths of resin cements to zirconia ceramics;Kitayama S;Dental Materials Journal,2009

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