Structural and optical properties o plasma-deposited a-C:H:Si:O:N films
Author:
Affiliation:
1. Universidade Estadual Paulista, Brasil
Publisher
FapUNIFESP (SciELO)
Subject
Organic Chemistry,Chemical Engineering (miscellaneous)
Reference45 articles.
1. Gas evolution studies for structural characterization of hexamethyldisilazane‐based a‐Si:C:N:H films;Gerstenberg K. W.;Journal of Applied Physics,1987
2. Plasma enhanced chemical vapor deposition of Si-N-C-H films from environmentally benign organosilanes;Levy R. A.;Materials Letters,1995
3. Structural and conductivity change caused by N, O and C incorporation in a-Si:H;Shimizu T.;Journal of Non-crystalline Solids,1998
4. A comparative study of plasma enhanced chemically vapor deposited SiOH and SiNCH films using the environmentally benign precursor diethylsilane;Levy R. A.;Materials Letters,2002
5. IR-study of a-SiCx: H and a-SiCxNy: H films for c-Si surface passivation;Vetter M.;Thin Solid Films,2004
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