Annealing and Extended Etching Improve a Torsional Resonator for Thin Film Internal Friction Measurements-Reference-Cited by-同舟云学术

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Annealing and Extended Etching Improve a Torsional Resonator for Thin Film Internal Friction Measurements

Published:2018-06-18 Issue:suppl 2 Volume:21 Page:
ISSN:1980-5373
Container-title:Materials Research
language:
Short-container-title:Mat. Res.

Author:

Metcalf Thomas¹^ORCID,Liu Xiao¹^ORCID,Abernathy Matthew Robert¹^ORCID

Affiliation:

1. U.S. Naval Research Laboratory, United States of America

Publisher

FapUNIFESP (SciELO)

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

http://www.scielo.br/pdf/mr/v21s2/1516-1439-mr-21-s2-e20170875.pdf

Reference11 articles.

1. Vibrating Reed Internal Friction Apparatus for Films and Foils;Berry BS;IBM Journal of Research and Development,1975

2. On the modes and loss mechanisms of a high Q mechanical oscillator;Liu X;Applied Physics Letters,2001

3. Normal modes of a Si(100) double-paddle oscillator;Spiel CL;Review of Scientific Instruments,2001

4. An ultra-high Q silicon compound cantilever resonator for Young's modulus measurements;Metcalf TH;Review of Scientific Instruments,2013

5. Thermoelastic loss observed in a high Q mechanical oscillator;Photiadis DM;Physica B: Condensed Matter,2002

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Temperature effects on the nanoscale thermoelastic response of a SiO2 membrane;APL Materials;2024-05-01

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