Thickness Dependent Structural and Electrical Properties of Magnetron Sputtered Nanostructured CrN Thin Films
Author:
Affiliation:
1. Madanapalle Institute of Technology & Science, India
2. Yeungnam University, Republic of Korea
Publisher
FapUNIFESP (SciELO)
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Link
http://www.scielo.br/pdf/mr/v20n3/1516-1439-mr-1980-5373-MR-2016-0786.pdf
Reference24 articles.
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3. Influence of sputtering parameters and nitrogen on the microstructure of chromium nitride thin films deposited on steel substrate by direct-current reactive magnetron sputtering;Shah HN;Thin Solid Films,2010
4. Antiferromagnetic Structure of CrN;Corliss LM;Physical Review,1960
5. The magnetic and structural transitions in CrN and (CrMo)N;Ibberson RM;Physica B: Condensed Matter,1992
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