Hardness evaluation, stoichiometry and grain size of titanium nitride films obtained with plasma nitriding on Ti-6Al-4V samples
Author:
Affiliation:
1. Universidade Federal do Rio Grande do Sul, Brazil
Publisher
FapUNIFESP (SciELO)
Subject
General Physics and Astronomy,General Materials Science,General Chemistry
Link
http://www.scielo.br/pdf/rmat/v15n2/30.pdf
Reference8 articles.
1. "D.C. diode ion nitriding behavior of titanium and Ti-6AI-4V";CHEN K.C.;Thin Solid Films,1997
2. "Transmission electron microscopy and atomic force microscopy characterisation of titanium-base alloys nitrided under glow discharge";CZYRSKA-FILEMONOWICZ A.;Acta Materialia,2005
3. "Plasma assisted nitridation of Ti-6Al-4V";FOUQUET V.,2004
4. "Analysis of the phases developed by laser. nitriding Ti-6Al-4V alloys";HU C.;Acta mater,1997
5. "Surface modification and characterisation of Ti-Al-V alloys";LAKSHMI S.G.;Materials Chemistry and Physics,2002
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1. Comparative Study of Physicochemical Properties and Biocompatibility (L929 and MG63 Cells) of TiN Coatings Obtained by Plasma Nitriding and Thin Film Deposition;ACS Biomaterials Science & Engineering;2021-07-22
2. Hollow cathode plasma nitriding of medical grade Ti6Al4V: A comprehensive study;Journal of Biomaterials Applications;2020-06-22
3. Tribological properties of TC4 titanium alloy treated by plasma nitriding at different temperatures;CAILIAO GONGCHENG;2020
4. The influence of nitrogen to hydrogen ratio and temperature on thickness and phase composition in plasma nitrided Ti-6Al-4V;Matéria (Rio de Janeiro);2019
5. Effect of Plasma Nitriding on the Creep and Tensile Properties of the Ti-6Al-4V Alloy;Metals;2018-08-07
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