Author:
Skorupa W.,Panknin D.,Voelskow M.,Anwand W.,Gebel T.,Yankov R. A.,Paul Silke,Lerch Wilfried,
Abstract
ABSTRACTThe use of flash lamp annealing for processing semiconductor materials is outlined. Specific applications include ultra-shallow junction formation and heteroepitaxial growth of improved quality thin films of cubic silicon carbide. It is demonstrated that flash lamp annealing holds great promise as a technique for fabricating novel devices.
Publisher
Springer Science and Business Media LLC
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