Exafs Study of a-Si1−xGex:H, a-Si1−x Cx:H and a-Si1−xNx:H at the Si K-Edge-Reference-Cited by-同舟云学术

Exafs Study of a-Si1−xGex:H, a-Si1−x Cx:H and a-Si1−xNx:H at the Si K-Edge

Published:1987 Issue: Volume:95 Page:
ISSN:0272-9172
Container-title:MRS Proceedings
language:en
Short-container-title:MRS Proc.

Author:

Filipponi A.,Fiorini P.,Evangelisti F.,Mobilio S.

Abstract

AbstractThe structure of three series of hydrogenated amorphous Si-based alloys was studied by EXAFS at the Si K-edge. Average bond-lengths and first shell compositions were determined. It is shown that the two atomic species are randomly distributed in a-Si1−xGex:H whereas a chemical ordered composition is favored in a-Si1−xNx:H

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

Reference7 articles.

1. 6) Sala D. della , unpublished.

2. Extended x-ray absorption fine-structure study of hydrogenated amorphous silicon-germanium alloys

3. Extended x-ray absorption fine structure analysis of interatomic distances, coordination numbers, and mean relative displacements in disordered alloys

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