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High-resolution direct-write patterning using focused ion beams

Published:2014-04 Issue:4 Volume:39 Page:336-341
ISSN:0883-7694
Container-title:MRS Bulletin
language:en
Short-container-title:MRS Bull.

Author:

Ocola Leonidas E.,Rue Chad,Maas Diederik

Abstract

Abstract

Publisher

Springer Science and Business Media LLC

Subject

Physical and Theoretical Chemistry,Condensed Matter Physics,General Materials Science

Reference45 articles.

1. A review of ion projection lithography

2. Towards secondary ion mass spectrometry on the helium ion microscope: An experimental and simulation based feasibility study with He+ and Ne+ bombardment

3. Dry fabrication of microdevices by the combination of focused ion beam and cryogenic deep reactive ion etching

4. Focused ion beam lithography

5. Development of new FIB technology for EUVL mask repair

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