Orientation Dependence Of Surface Passivation For Semi-Insulating Gaas

Abstract

AbstractWe report on the orientation dependence ((100), (110) and (111) ) of photoluminescence (PL), photoreflectance (PR) and Surface Photo-Voltage (SPV) for sulfur passivated bulk semiinsulating (SI) GaAs. Near band gap PL peak intensities (bound-exciton and acceptor-related) were enhanced following (NH4)2S or S2Cl2 treatment of GaAs for all orientations. The reduction of surface recombination velocity (from PL data) was orientation dependent and especially pronounced for the case of (111)A and (111)B orientations. The effect of thin dielectric layers deposited on S-treated surfaces was also investigated, particularly for (100) and (111)A orientations. SPV data shows a strong increase in the above band gap signal after both Streatment and dielectric film deposition, which was higher than that measured for only S-treated surfaces. PR data showed an increase in the interfacial electric field following deposition of dielectric film. The results of absolute S-surface coverage measurements using particle-induced X-ray emission measurements were correlated with the optical characteristics.