Fast Simulation of Pattern Formation and Process Dependencies in Roller Nanoimprint Lithography

Abstract

ABSTRACTWe contribute a fast numerical approach to simulating the roller-imprinting of complex patterns. The technique predicts the extent to which imprinted patterns are fully formed, as well as variation of the imprinted material’s residual layer thickness (RLT). The approach can be used for roll-to-roll and roll-to-plate configurations, and for rollers with or without elastomeric coatings. If patterns vary in pitch, shape or areal density across the roller, RLT and the completeness of pattern transfer can vary with position as well as with processing parameters, and our technique is able to model these effects. The technique has been successfully validated against published experimental data from two different roller-NIL processes: one involving an ultraviolet-curing resist film on a glass plate, and another involving a flexible thermoplastic web softened at its surface.